DocumentCode :
1070358
Title :
Giant magnetoresistance, antiferromagnetic volume fraction and saturation field in Co/Cu multilayers
Author :
Rupp, G. ; van den Berg, H.A.M.
Author_Institution :
Siemens AG, Erlangen, Germany
Volume :
29
Issue :
6
fYear :
1993
fDate :
11/1/1993 12:00:00 AM
Firstpage :
3102
Lastpage :
3104
Abstract :
A series of Co/Cu multilayers is prepared exhibiting giant magnetoresistance in the first maximum of the oscillatory exchange coupling regime. The size of the magnetoresistance strongly depends on the thickness of the layers involved, the substrate material, the buffer layer and the sputtering conditions. The analysis of resistive and magnetic data reveals that to a first approximation the magnetoresistance linearly depends on the volume fraction of Co coupled antiferromagnetically. This volume fraction can be derived from the extrapolated remanent magnetization. The authors investigate under which conditions and to what extent the linearity applies. A maximum of the magnetoresistivity of 72% at room temperature is reached under optimized conditions
Keywords :
antiferromagnetic properties of substances; cobalt; copper; exchange interactions (electron); magnetic multilayers; magnetic thin films; magnetoresistance; metallic thin films; sputtered coatings; Co-Cu multilayers; antiferromagnetic volume fraction; buffer layer; extrapolated remanent magnetization; giant magnetoresistance; magnetic data; magnetoresistivity; oscillatory exchange coupling regime; saturation field; sputtering conditions; substrate material; volume fraction; Antiferromagnetic materials; Buffer layers; Couplings; Giant magnetoresistance; Linear approximation; Magnetic analysis; Magnetic materials; Magnetic multilayers; Magnetization; Sputtering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.280886
Filename :
280886
Link To Document :
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