Title :
Current-voltage characteristics of molecular conductors: two versus three terminal
Author :
Damle, Prashant ; Rakshit, Titash ; Paulsson, Magnus ; Datta, Supriyo
Author_Institution :
Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fDate :
9/1/2002 12:00:00 AM
Abstract :
Addresses the question of whether a "rigid molecule" (one which does not deform in an external field) used as the conducting channel in a standard three-terminal MOSFET configuration can offer any performance advantage relative to a standard silicon MOSFET. A self-consistent solution of coupled quantum transport and Poisson\´s equations shows that even for extremely small channel lengths (about 1 nm), a "well-tempered" molecular FET demands much the same electrostatic considerations as a "well-tempered" conventional MOSFET. In other words, we show that just as in a conventional MOSFET, the gate oxide thickness needs to be much smaller than the channel length (length of the molecule) for the gate control to be effective. Furthermore, we show that a rigid molecule with metallic source and drain contacts has a temperature independent subthreshold slope much larger than 60 mV/decade, because the metal-induced gap states in the channel prevent it from turning off abruptly. However, this disadvantage can be overcome by using semiconductor contacts because of their band-limited nature.
Keywords :
Green´s function methods; Poisson equation; insulated gate field effect transistors; molecular electronics; Poisson´s equations; channel lengths; conducting channel; coupled quantum transport; current-voltage characteristics; gate oxide thickness; metal-induced gap states; molecular FET; rigid molecule; self-consistent solution; semiconductor contacts; temperature independent subthreshold slope; three-terminal MOSFET configuration; Conductors; Current-voltage characteristics; Electrostatics; FETs; MOSFET circuits; Poisson equations; Silicon; Temperature; Thickness control; Turning;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2002.806825