DocumentCode :
1070779
Title :
MA-12 new dimensions in optical lithography
Author :
Oldham, W.G.
Volume :
27
Issue :
11
fYear :
1980
fDate :
11/1/1980 12:00:00 AM
Firstpage :
2176
Lastpage :
2176
Keywords :
Apertures; Coherence; Insulation; Lithography; Microwave devices; Optical films; Optical refraction; Resists; Silicon on insulator technology; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20173
Filename :
1480966
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1070779
