DocumentCode
1070779
Title
MA-12 new dimensions in optical lithography
Author
Oldham, W.G.
Volume
27
Issue
11
fYear
1980
fDate
11/1/1980 12:00:00 AM
Firstpage
2176
Lastpage
2176
Keywords
Apertures; Coherence; Insulation; Lithography; Microwave devices; Optical films; Optical refraction; Resists; Silicon on insulator technology; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1980.20173
Filename
1480966
Link To Document