WA-A3 formation of n-p-n structures by a combination of double implantation and single-pulse laser annealing

Author

Tamura, Masato ; Ohkura, Michiko ; Natsuaki, N. ; Tokuyama, Takeshi

Volume

Issue

fYear

1980

fDate

11/1/1980 12:00:00 AM

Firstpage

2193

Lastpage

2194

Keywords

Annealing; Atomic beams; Atomic layer deposition; Diffusion processes; Impurities; Laboratories; Lattices; Optical pulses; Silicon; Solids;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

DOI

10.1109/T-ED.1980.20222

Filename

1481015

Link To Document