Applications of high-speed data acquisition for bipolar device-yield analysis

An in-line process-monitoring system has been established in a high-volume manufacturing environment which has defined a data base that can be accessed for retrieval and display of data using histograms and scatter plots. Applications of high-speed data acquisition have been expanded to include wafer mapping which illustrates device and process parameters and their relationship to die yield. These relationships can be determined with a 95-percent confidence level.