DocumentCode
1071887
Title
Improved performance of implanted n+-p Hg1-x Cdx Te photodiodes using insulated field plates
Author
Sood, A.K. ; Tobin, S.P.
Author_Institution
Honeywell Electro-Optics Center, Lexington, MA
Volume
1
Issue
1
fYear
1980
fDate
1/1/1980 12:00:00 AM
Firstpage
12
Lastpage
14
Abstract
Using insulated field plates, we have demonstrated that surface leakage had been limiting the Ro A of our ion-implanted n+ -on-p (Hg, Cd) Te photodiodes. This leakage is believed to be tunneling current across a pinched-off depletion region at the surface. We have used gated diodes to eliminate leakage and improve Ro A to the diffusion limit at 77°K for Hg0.8 Cd0.2 Te photodiodes.
Keywords
Fabrication; Infrared detectors; Leakage current; Notice of Violation; Photodiodes; Physics; Silicon; Temperature dependence; Tunneling; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1980.25209
Filename
1481071
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