DocumentCode :
1072024
Title :
A quantitative model of the effect of grain size on the resistivity of polycrystalline silicon resistors
Author :
Lu, N.C.C. ; Gerzberg, L. ; Meindl, J.D.
Author_Institution :
Stanford University, Stanford, California
Volume :
1
Issue :
3
fYear :
1980
fDate :
3/1/1980 12:00:00 AM
Firstpage :
38
Lastpage :
41
Abstract :
The effect of grain size on the resistivity of polycrystalline silicon films has been investigated theoretically and experimentally. It is shown that existing models do not accurately predict the resistivity dependence on doping concentration as grain size increases. A new modified trapping theory demonstrates from a good agreement with experimental results that a significant increase in grain size drastically reduces the sensitivity of polysilicon resistivity to doping concentration.
Keywords :
Annealing; Boron; Conductivity; Doping; Electrical resistance measurement; Grain size; Resistors; Semiconductor process modeling; Silicon; Size measurement;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1980.25222
Filename :
1481084
Link To Document :
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