Title :
Limitations on single beam production lithography
Author_Institution :
Rome Air Development Center, Griffiss, NY
fDate :
10/1/1980 12:00:00 AM
Abstract :
An analysis is presented showing there is little chance that single beam production methods will be able to provide an economic means of producing high reliability LSI circuits having a chip-edge to element ratio above two thousand.
Keywords :
Bandwidth; Electron beams; Geometry; Integrated circuit reliability; Ion beams; Large scale integration; Lithography; Production systems; Resists; Testing;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1980.25286
