DocumentCode
1072664
Title
Limitations on single beam production lithography
Author
Levi, Mark W.
Author_Institution
Rome Air Development Center, Griffiss, NY
Volume
1
Issue
10
fYear
1980
fDate
10/1/1980 12:00:00 AM
Firstpage
194
Lastpage
196
Abstract
An analysis is presented showing there is little chance that single beam production methods will be able to provide an economic means of producing high reliability LSI circuits having a chip-edge to element ratio above two thousand.
Keywords
Bandwidth; Electron beams; Geometry; Integrated circuit reliability; Ion beams; Large scale integration; Lithography; Production systems; Resists; Testing;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1980.25286
Filename
1481148
Link To Document