• DocumentCode
    1072754
  • Title

    The effect of annealing on moment density and phase formations in Fe-N films

  • Author

    Gao, Cheng ; Shamsuzzoha, Mohammad

  • Author_Institution
    Alabama Univ., Tuscaloosa, AL
  • Volume
    29
  • Issue
    6
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    3046
  • Lastpage
    3048
  • Abstract
    Fe-N films are prepared by argon-nitrogen reactive RF sputtering at a total pressure of 6 mTorr, an argon flow rate of 100 standard cubic centimeters per minute (sccm) and a nitrogen flow rate R of 0 to 30 sccm. For R⩽15 sccm, little changes in phase structure and moment (Δσ⩽6%) are seen for annealing temperatures TA⩽300°C. Above 300°C, changes in the phase structure and moment (Δσs⩾12%) are observed. For R=30 sccm, no phase changes are observed at all annealing temperatures and the moment is found to be constant (Δσs⩽5%). The phases observed by X-ray and transmission electron diffraction depend on R and include α-Fe(N), Fe16N2 and Fe4N. These data could be correlated with the moment. The Curie temperature of Fe4N is 480~510°C, in good agreement with previous result
  • Keywords
    Curie temperature; X-ray diffraction examination of materials; annealing; electron diffraction examination of materials; iron compounds; magnetic moments; magnetic thin films; solid-state phase transformations; sputter deposition; 450 C; 480 to 510 C; 6 mTorr; Ar flow rate; Ar-N2; Curie temperature; FexNy films; N2 flow rate; X-ray diffraction; annealing temperatures; magnetic moment density; phase formations; phase structure; reactive RF sputtering; transmission electron diffraction; Annealing; Argon; Electrical resistance measurement; Electrons; Information technology; Inorganic materials; Nitrogen; Radio frequency; Temperature; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.281112
  • Filename
    281112