DocumentCode :
1073529
Title :
Real space transfer noise in buried-channel devices
Author :
Tang, Jeff Y. ; Hess, Karl
Author_Institution :
University of Illinois at Urbana-Champaign, Urbana, IL
Volume :
28
Issue :
3
fYear :
1981
fDate :
3/1/1981 12:00:00 AM
Firstpage :
285
Lastpage :
289
Abstract :
The noise due to the spilling of hot electrons out of potential wells and subsequent trapping is calculated. This noise is the real space analogy to the intervalley noise in transfer devices. Our results show that this noise can be important for heterojunction FET´s and MOS devices. The Thornber formalism used in our calculation is general and applies for nonstationary cases. Results are given only for the specific case of buried-channel charge-coupled devices because for other devices this type of noise can be derived as a special case.
Keywords :
Charge carrier processes; Electron emission; Electron mobility; Electron traps; Heterojunctions; Interface states; MOS devices; Potential well; Semiconductor device noise; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1981.20329
Filename :
1481481
Link To Document :
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