Influence of the thermal treatments and mechanical stress on the magnetic bistable behaviour in a Co-Si-B amorphous wire

Author

Aragoneses, P. ; Blanco, J.M. ; Gonzalez, J. ; Vazquez, M.

Author_Institution

Univ. del Pais Vasco, San Sebastian, Spain

Volume

29

Issue

6

fYear

1993

fDate

11/1/1993 12:00:00 AM

Firstpage

3475

Lastpage

3477

Abstract

The magnetic bistable behavior of Co_72.5Si_12.5B₁₅ amorphous wire has been investigated. The dependence of the switching field, H*, and reduced remanence, m_r, on applied tensile stress (σ_a) in wires subjected to single-current and stress-current annealing was observed. This dependence was obtained from the M_z- H_z and M_z-H_φ hysteresis loops of the wire, and they suggest a different mechanism to that of the nucleation process for explaining the bistable magnetic behavior of the wire

Keywords

amorphous state; annealing; boron alloys; cobalt alloys; ferromagnetic properties of substances; magnetic hysteresis; magnetic properties of amorphous substances; magnetic switching; magnetomechanical effects; silicon alloys; Co-Si-B; Co_72.5Si_12.5B₁₅ amorphous wire; applied tensile stress; hysteresis loops; magnetic bistable behaviour; mechanical stress; nucleation process; reduced remanence; single current annealing; stress-current annealing; switching field; thermal treatments; Amorphous magnetic materials; Amorphous materials; Annealing; Current density; Magnetic domains; Magnetic flux; Magnetic hysteresis; Magnetostriction; Thermal stresses; Wire;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.281201

Filename

281201