• DocumentCode
    1073981
  • Title

    Characteristics of planar doped FET structures

  • Author

    Board, Kenneth ; Chandra, Amitabh ; Wood, Colin E.C. ; Judaprawira, Seno ; Eastman, Lester F.

  • Author_Institution
    University of Wales, Swansea, UK
  • Volume
    28
  • Issue
    5
  • fYear
    1981
  • fDate
    5/1/1981 12:00:00 AM
  • Firstpage
    505
  • Lastpage
    510
  • Abstract
    The recent demonstration of single atomic planes of doping using molecular beam epitaxy gives rise to the possibility of single plane FET´s with the channel confined to the dopant plane. In this paper an analysis of the Structure is presented which takes account of the spread of the free-carrier density normal to the plane. This rigorous analysis is compared with the simple case of a plane of free carriers. Under certain conditions the simple model gives good agreement with the exact analysis but for shallow, low-density planes, substantial departures from the simple model occur.
  • Keywords
    Atomic beams; Atomic layer deposition; Capacitance; Doping profiles; Electrons; FETs; Gallium arsenide; Molecular beam epitaxial growth; Semiconductor process modeling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1981.20374
  • Filename
    1481526