DocumentCode
1074087
Title
Injection-gated DI diode with gate-controlled holding voltage
Author
Kapoor, Ashok K. ; Henderson, H. Thurman
Author_Institution
University of Cincinnati, Cincinnati, OH
Volume
28
Issue
5
fYear
1981
fDate
5/1/1981 12:00:00 AM
Firstpage
557
Lastpage
560
Abstract
Double-injection (DI) devices consist of an anode (p+) and a cathode (n+) in a semi-insulator containing deep traps and exhibit S-type differential negative resistance (DNR) similar to SCR´s under proper conditions [1]-[6]. Recently this laboratory reported a DI device with a hole emitting (p+) gate between the anode and the cathode which resulted in substantial improvement in the switching threshold voltage VTh as well as extreme sensitivity Of VTh to gate voltage [7]. A major limitation of these DI devices was Seen to be the relatively high ON state voltage. In this paper, we describe some recent results where the ON state or holding voltage VH is controlled by a supplementary gate bias which allows VH to be arbitrarily reduced to zero or even to a negative value by applying sufficiently large negative voltages to the controlling gate with respect to the cathode.
Keywords
Anodes; Cathodes; Electrodes; Gold; Impurities; Laboratories; Semiconductor diodes; Silicon compounds; Threshold voltage; Voltage control;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1981.20382
Filename
1481534
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