Magnetic microactuation of polysilicon flexure structures

Author

Judy, Jack W. ; Muller, Richard S. ; Zappe, Hans H.

Author_Institution

Sensor & Actuator Center, California Univ., Berkeley, CA, USA

Volume

4

Issue

4

fYear

1995

fDate

12/1/1995 12:00:00 AM

Firstpage

162

Lastpage

169

Abstract

A microactuator technology that combines magnetic thin films with polysilicon flexural structures is described. Devices are constructed in a batch-fabrication process that combines electroplating with conventional lithography, materials, and equipment. A microactuator consisting of a 400×(47-40)×7 μm³ rectangular plate of NiFe attached to a 400×(0.9-1.4)×2.25 μm³ polysilicon cantilever beam has been displaced over 1.2 mm, rotated over 180°, and actuated with over 0.185 nNm of torque. The microactuator is capable of motion both in and out of the wafer plane and has been operated in a conductive fluid environment. Theoretical expressions for the displacement and torque are developed and compared to experimental results

Keywords

electroplating; elemental semiconductors; ferromagnetic materials; iron alloys; lithography; magnetic thin film devices; microactuators; nickel alloys; silicon; 1.2 mm; NiFe-Si; batch-fabrication process; cantilever beam; conductive fluid environment; displacement; electroplating; lithography; magnetic microactuation; magnetic thin films; microactuator technology; polysilicon flexure structures; rectangular plate; torque; Actuators; Fabrication; Magnetic fields; Magnetic materials; Magnetic sensors; Microactuators; Micromagnetics; Micromechanical devices; Saturation magnetization; Torque;

fLanguage

English

Journal_Title

Microelectromechanical Systems, Journal of

Publisher

ieee

ISSN

1057-7157

Type

jour

DOI

10.1109/84.475542

Filename

475542