DocumentCode :
1074652
Title :
Fabrication of 45° mirrors together with well-defined v-grooves using wet anisotropic etching of silicon
Author :
Strandman, Carola ; Rosengren, Lars ; Elderstig, Håkan G A ; Bäcklund, Ylva
Author_Institution :
Dept. of Technol., Uppsala Univ., Sweden
Volume :
4
Issue :
4
fYear :
1995
fDate :
12/1/1995 12:00:00 AM
Firstpage :
213
Lastpage :
219
Abstract :
The most commonly used microstructure for passive fiber alignment is the ordinary v-groove, defined by {111} planes on a (100) silicon wafer. The plane at the end of the groove, having a 54.7° angle to the surface, can be used as a reflecting mirror. For single-mode fiber applications, a 45° mirror is advantageous together with high accuracy in the position of the fiber, i.e. a smooth mirror and good control of the groove geometry is needed. Two techniques are presented to form 45° mirrors along with well-defined grooves in silicon, using the wet anisotropic etchants EDP and KOH. These techniques are used: (1) to reveal {110} planes on (100) silicon and (2) to make {111} mirrors on wafers that are cut 9.7° off the [100] axis. On (100) silicon, EDP without pyrazine gave the best result. The best mirror and groove reproducibility was found on off-axis cut silicon, using 36 wt.% KOH, with isopropyl alcohol added
Keywords :
elemental semiconductors; etching; micromachining; mirrors; optical fabrication; optical fibre couplers; silicon; (100) Si wafer; 45° mirrors; EDP; KOH; Si; isopropyl alcohol; microstructure; mirror fabrication; passive fiber alignment; single-mode fiber applications; v-grooves; wet anisotropic etching; Anisotropic magnetoresistance; Fabrication; Fiber lasers; Mirrors; Optical fibers; Optical surface waves; Silicon; Surface emitting lasers; Vertical cavity surface emitting lasers; Wet etching;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.475548
Filename :
475548
Link To Document :
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