DocumentCode
1074685
Title
Interactions in CoPtCr/SiO2 composite thin films
Author
El-Hilo, M. ; O´Grady, K. ; Nguyen, T.A. ; Baumgart, P. ; Sanders, I.L.
Author_Institution
SEECS, Univ. Coll. of North Wales, Bangor, UK
Volume
29
Issue
6
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
3724
Lastpage
3726
Abstract
The behavior of CoPtCr/SiO2 composite thin films with variable percentages of SiO2 (0%→35%) is reported. From measurements of remanence curves and interaction characterization via the delta plot curves, films with 20%→24% SiO2 shows a wider range of switching fields and lower magnitude of interaction in comparison with the films containing a lower concentration of SiO2
Keywords
chromium alloys; cobalt alloys; coercive force; exchange interactions (electron); ferromagnetic properties of substances; magnetic hysteresis; magnetic switching; magnetic thin films; platinum alloys; remanence; silicon compounds; sputtered coatings; CoPtCr-SiO2; CoPtCr/SiO2 composite thin films; coercivity; cooperative switching; delta plot curves; exchange coupled grains; interaction characterization; magnetic thin films; remanence curves; squareness co-sputtered; switching fields; Coercive force; Energy barrier; Magnetic separation; Magnetic susceptibility; Magnetization; Remanence; Shape; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.281282
Filename
281282
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