• DocumentCode
    1075099
  • Title

    Influence of insulators on R/W process in laminated film heads

  • Author

    Kobayashi, Hiroshi ; Ura, Masashi ; Ozeki, Tatsuo

  • Author_Institution
    Mitsubishi Electric Corp., Hyogo, Japan
  • Volume
    29
  • Issue
    6
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    3846
  • Lastpage
    3848
  • Abstract
    The influence of insulators on read/write (R/W) process in laminated film heads was investigated by the Bitter method and computer simulations. Some unrecorded areas exist in a recording track, and the areas correspond to the position of insulators at the trailing side. The effective recording width depends on not only the recording current but also the relative positions of insulators at the leading and trailing edges. These results were confirmed by the simulation. In the reproducing process, the loss caused by the insulator is smaller than the ratio of the track width by the insulator´s thickness. In both R/W characteristics, the laminated film head with inline insulators at both sides of the gap is superior to that with the staggered insulators
  • Keywords
    digital simulation; finite element analysis; laminates; magnetic heads; magnetic multilayers; magnetic recording; magnetic thin film devices; video recording; 3D FEM; Bitter method; R/W process; SiO2; computer simulations; digital VCR; insulator influence; laminated film heads; multilayer head; numerical analysis; read/write characteristics; recording current; recording width; reproducing process; sendust magnetic film; Computer simulation; Dielectrics and electrical insulation; Frequency; Insulation life; Magnetic films; Magnetic heads; Magnetic multilayers; Magnetic recording; Saturation magnetization; Video recording;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.281318
  • Filename
    281318