Title :
A Large-Volume Stable Atmospheric Air Microwave Plasma Based on Inductive Coupling Window—Rectangular Resonator
Author :
Zhong Wang ; Gui Xin Zhang ; Zhi Dong Jia
Author_Institution :
Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
Abstract :
This paper introduces a novel microwave plasma source based on inductive coupling window-rectangular resonator. It consists of a WR430 waveguide, an inductive coupling window, a rectangular resonator, a closed cuboid quartz cavity, and a sliding short-circuit plunger. This microwave plasma source can produce a large-volume stable atmospheric air microwave plasma, and the plasma size is at the smallest 63 mm × (40-50) mm × 30 mm. The microwave reflectance ratio of the microwave plasma source exactly at higher power is roughly unrelated to the input microwave power before the plasma is produced. After the plasma is generated, the reflectance ratio increases with the increase in the input microwave power and the ratio at lower power is even smaller than that before the plasma is produced. The gas temperature of the atmospheric air microwave plasma is approximately changeless with the input microwave power. The atmospheric air microwave plasma cuts off the microwave with the frequency of 2450 MHz.
Keywords :
microwave resonators; plasma filled waveguides; plasma sources; plasma temperature; WR430 waveguide; closed cuboid quartz cavity; frequency 2450 MHz; gas temperature; inductive coupling window-rectangular resonator; input microwave power; large-volume stable atmospheric air microwave plasma; microwave plasma source; microwave reflectance ratio; plasma size; size 30 mm to 63 mm; sliding short-circuit plunger; Microwave FET integrated circuits; Microwave antennas; Microwave circuits; Microwave integrated circuits; Microwave measurement; Plasma sources; Atmospheric air microwave plasma; gas temperature; inductive coupling window-rectangular resonator; inductive coupling window??rectangular resonator; microwave cutoff; reflectance ratio; reflectance ratio.;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2319156