• DocumentCode
    1075235
  • Title

    In-plane anisotropy studies in amorphous CoFeNb films

  • Author

    Contreras, M.C. ; Rivas, M. ; Iglesias, I. ; Corrales, J.A. ; Krishnan, R. ; Tessier, M.

  • Author_Institution
    Departamento de Fisica, Oviedo Univ., Spain
  • Volume
    29
  • Issue
    6
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    3885
  • Lastpage
    3887
  • Abstract
    Uniaxial anisotropy field, Hk, and local anisotropy fluctuation were studied as a function of argon pressure during deposition for RF sputtered amorphous CoFeNb films. Influence of PAr on anistropy field Hk, local anisotropy constant Kloc, and S (structure constant) is discussed. The magnitude of S and KlocV1/2 were found to be strongly dependent on P Ar
  • Keywords
    cobalt alloys; ferromagnetic properties of substances; iron alloys; magnetic anisotropy; magnetic fields; magnetic properties of amorphous substances; magnetic thin films; niobium alloys; sputtered coatings; CoFeNb; RF sputtered amorphous films; local anisotropy fluctuation; structure constant; uniaxial anisotropy field; Amorphous materials; Anisotropic magnetoresistance; Argon; Electrons; Fluctuations; Magnetic analysis; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Saturation magnetization;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.281331
  • Filename
    281331
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1075235