Title :
MR ratio enhancement by NOL current-confined-path structures in CPP spin valves
Author :
Fukuzawa, Hideaki ; Yuasa, Hiromi ; Hashimoto, Susumu ; Koi, Katsuhiko ; Iwasaki, Hitoshi ; Takagishi, Masayuki ; Tanaka, Yoichiro ; Sahashi, Masashi
Author_Institution :
Toshiba Corp., Tokyo, Japan
fDate :
7/1/2004 12:00:00 AM
Abstract :
We have compared the magnetoresistance (MR) performance of current-confined-path (CCP) current-perpendicular-to-plane giant magnetoresistance (CPP-GMR) spin valve films with a nano-oxide-layer (NOL), made between natural oxidation (NO) and ion-assisted oxidation (IAO). For the NO, an MR ratio was only 1.5% at an RA of 370 mΩμm2, whereas for the IAO, an MR ratio was greatly increased to 5.4% at an RA of 500 mΩμm2. Fitted data by the Valet-Fert model showing larger MR enhancement effect by the IAO is explained by the improvement of the metal-purity of the Cu inside the CCP structure. By further improvement of metal-purity of the Cu, a large MR ratio of more than 30% can be expected at a small RA of 300 mΩμm2. The CCP-CPP spin valve film is a promising candidate for realizing high-density recording heads for 200 to 400-Gbpsi recording.
Keywords :
giant magnetoresistance; magnetic heads; magnetic thin films; nanostructured materials; oxidation; perpendicular magnetic recording; spin valves; CCP-CPP spin valve film; CPP spin valves; Cu; MR enhancement; MR ratio enhancement; NOL current-confined-path structures; Valet-Fert model; current-perpendicular-to-plane giant magnetoresistance; fitted data; high-density recording heads; ion-assisted oxidation; magnetoresistance performance; metal purity; nano-oxide-layer; natural oxidation; spin valve films; Giant magnetoresistance; Lamination; Lithography; Magnetic heads; Oxidation; Scattering; Space technology; Spin valves; Testing; Tunneling magnetoresistance; CPP-GMR; current-confined-path; oxides; spin valves;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2004.829185