DocumentCode :
1075489
Title :
I-2 shallow silicide contact for shallow junction devices
Author :
Tu, K.N.
Volume :
28
Issue :
10
fYear :
1981
fDate :
10/1/1981 12:00:00 AM
Firstpage :
1208
Lastpage :
1208
Keywords :
Alloying; Contacts; Electron emission; Gallium arsenide; Hot carriers; Impact ionization; Large scale integration; Schottky barriers; Silicides; Silicon alloys;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1981.20516
Filename :
1481668
Link To Document :
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