DocumentCode
1075521
Title
The hardness of iron (N) films sputtered in Ar-N2 mixtures
Author
Jones, R.E., Jr. ; White, R.L. ; Williams, J.L. ; Qian, X.-W.
Author_Institution
Adstar-IBM, San Jose, CA, USA
Volume
29
Issue
6
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
3966
Lastpage
3968
Abstract
RF sputtered iron films can be significantly hardened from about 13 GPa to about 19 GPa by adding nitrogen to the sputtering atmosphere. The dependencies of hardness on the operating parameters for RF diode sputtering are reported. At a fixed bias the hardness depends only on the ratio of nitrogen partial pressure to iron deposition rate. The hardness correlates well with grain size, increasing for decreasing grain size
Keywords
grain size; hardness testing; iron; magnetic heads; sputtered coatings; Ar; Ar-N2; Fe; N2; RF sputtered films; deposition rate; fixed bias; grain size; operating parameters; partial pressure; sputtering atmosphere; Atmosphere; Diodes; Grain size; Iron; Magnetic films; Magnetic heads; Nitrogen; Radio frequency; Sputtering; Substrates;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.281358
Filename
281358
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