DocumentCode :
1075897
Title :
IVA-8 heteroepitaxial growth of cubic silicon carbide on foreign substrates
Author :
Matsunami, H. ; Nishino, S. ; Ono, H.
Volume :
28
Issue :
10
fYear :
1981
fDate :
10/1/1981 12:00:00 AM
Firstpage :
1235
Lastpage :
1236
Keywords :
Buffer layers; Chemical vapor deposition; Crystals; Degradation; Electron mobility; Silicon carbide; Sputtering; Substrates; Temperature sensors; X-ray diffraction;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1981.20556
Filename :
1481708
Link To Document :
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