Title :
S2 F10 Formation in Computer Simulation Studies of the Breakdown of SF6
Author_Institution :
Chemical Kinetics Division National Bureau of Standards Gaithersburg, MD
Abstract :
The chemistry subsequent to the dielectric breakdown of SF6 under "mild" conditions has been modeled on the basis of known or estimated chemical kinetic data for the neutral reactive species postulated to be formed in the breakdown process. The emphasis is on the significance of S2FlO as an end product of dielectric breakdown and on the role of water vapor in S2F10 formation.
Keywords :
Atmospheric modeling; Chemical processes; Chemistry; Computer simulation; Dielectric breakdown; Electric breakdown; Kinetic theory; NIST; Sulfur hexafluoride; Switches;
Journal_Title :
Electrical Insulation, IEEE Transactions on
DOI :
10.1109/TEI.1987.298919
