DocumentCode
1075902
Title
S2 F10 Formation in Computer Simulation Studies of the Breakdown of SF6
Author
Herron, J.T.
Author_Institution
Chemical Kinetics Division National Bureau of Standards Gaithersburg, MD
Issue
4
fYear
1987
Firstpage
523
Lastpage
525
Abstract
The chemistry subsequent to the dielectric breakdown of SF6 under "mild" conditions has been modeled on the basis of known or estimated chemical kinetic data for the neutral reactive species postulated to be formed in the breakdown process. The emphasis is on the significance of S2FlO as an end product of dielectric breakdown and on the role of water vapor in S2F10 formation.
Keywords
Atmospheric modeling; Chemical processes; Chemistry; Computer simulation; Dielectric breakdown; Electric breakdown; Kinetic theory; NIST; Sulfur hexafluoride; Switches;
fLanguage
English
Journal_Title
Electrical Insulation, IEEE Transactions on
Publisher
ieee
ISSN
0018-9367
Type
jour
DOI
10.1109/TEI.1987.298919
Filename
4081452
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