• DocumentCode
    1076448
  • Title

    2-kHz repetition rate XeF laser

  • Author

    Wang, Charles P. ; Gibb, Owen L.

  • Author_Institution
    The Aerospace Corporation, Los Angeles, CA, USA
  • Volume
    15
  • Issue
    5
  • fYear
    1979
  • fDate
    5/1/1979 12:00:00 AM
  • Firstpage
    318
  • Lastpage
    321
  • Abstract
    High-repetition-rate laser action, up to 2 kHz, has been demonstrated in XeF molecules at 351 and 353 nm by using a blowdown fast transverse-flow system and a four-circuit, thyratron-switched, low inductance pulse generator. For a typical run, the transverse flow was uniform, and the average flow velocity was 25 m/s across a discharge region of 1.4 \\times 0.4 \\times 30 cm3. The gas mixture used was He:Xe:NF3= 100:1.5:0.5, and the total pressure was varied from 600-1200 torr. For single-pulse operation, the maximum laser output energy was 22 mJ/pulse, and the electric efficiency was 0.4 percent. For a 2-kHz repetition rate, the average laser output energy was approximately 12 mJ/pulse with 50 percent variations. Hence, an average output power of 24 W was obtained.
  • Keywords
    Noble-gas lasers; Pulsed lasers; Ultraviolet lasers; Electrodes; Gas lasers; Inductance; Laser excitation; Optical pulse generation; Optical pulses; Power generation; Power lasers; Pulse generation; Pump lasers;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.1979.1070019
  • Filename
    1070019