• DocumentCode
    1076521
  • Title

    Silicon-Germanium Nanostructures for Light Emitters and On-Chip Optical Interconnects

  • Author

    Tsybeskov, Leonid ; Lockwood, David J.

  • Author_Institution
    Electr. & Comput. Eng. Dept., New Jersey Inst. of Technol., Newark, NJ
  • Volume
    97
  • Issue
    7
  • fYear
    2009
  • fDate
    7/1/2009 12:00:00 AM
  • Firstpage
    1284
  • Lastpage
    1303
  • Abstract
    In this paper, we review the present status of light emitters based on SiGe nanostructures. In order to be commercially valuable, these light emitters should be efficient, fast, operational at room temperature, and, perhaps most important, compatible with the ldquomainstreamrdquo complementary metal-oxide-semiconductor (CMOS) technology. Another important requirement is in the emission wavelength, which should match the optical waveguide low-loss spectral region, i.e., 1.3-1.6 mum. Among other approaches, epitaxially grown Si/SiGe quantum wells and quantum dot/quantum well complexes produce efficient photoluminescence and electroluminescence in the required spectral range. Until recently, the major roadblocks for practical applications of these devices were strong thermal quenching of the luminescence quantum efficiency and a long carrier radiative lifetime. The latest progress in the understanding of physics of carrier recombination in Si/SiGe nanostructures is reviewed, and a new route toward CMOS compatible light emitters for on-chip optical interconnects is proposed.
  • Keywords
    CMOS integrated circuits; Ge-Si alloys; carrier lifetime; electroluminescence; epitaxial growth; integrated optoelectronics; light emitting devices; nanophotonics; nanostructured materials; optical interconnections; optical losses; photoluminescence; quenching (thermal); semiconductor quantum dots; semiconductor quantum wells; CMOS compatible light emitter; Si-SiGe; carrier radiative lifetime; carrier recombination; complementary metal-oxide-semiconductor; electroluminescence; epitaxial growth; on-chip optical interconnect; optical waveguide loss; photoluminescence; semiconductor quantum dot; semiconductor quantum well; silicon-germanium nanostructure; temperature 293 K to 298 K; thermal quenching; wavelength 1.3 mum to 1.6 mum; CMOS technology; Germanium silicon alloys; Light emitting diodes; Nanostructures; Optical interconnections; Optical waveguides; Quantum dots; Silicon germanium; Stimulated emission; Temperature; Electroluminescence; germanium; light emission; nanoclusters; nanostructures; photoluminescence; quantum dots; quantum wells; silicon; silicon-germanium;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/JPROC.2009.2020711
  • Filename
    5075757