DocumentCode :
1076521
Title :
Silicon-Germanium Nanostructures for Light Emitters and On-Chip Optical Interconnects
Author :
Tsybeskov, Leonid ; Lockwood, David J.
Author_Institution :
Electr. & Comput. Eng. Dept., New Jersey Inst. of Technol., Newark, NJ
Volume :
97
Issue :
7
fYear :
2009
fDate :
7/1/2009 12:00:00 AM
Firstpage :
1284
Lastpage :
1303
Abstract :
In this paper, we review the present status of light emitters based on SiGe nanostructures. In order to be commercially valuable, these light emitters should be efficient, fast, operational at room temperature, and, perhaps most important, compatible with the ldquomainstreamrdquo complementary metal-oxide-semiconductor (CMOS) technology. Another important requirement is in the emission wavelength, which should match the optical waveguide low-loss spectral region, i.e., 1.3-1.6 mum. Among other approaches, epitaxially grown Si/SiGe quantum wells and quantum dot/quantum well complexes produce efficient photoluminescence and electroluminescence in the required spectral range. Until recently, the major roadblocks for practical applications of these devices were strong thermal quenching of the luminescence quantum efficiency and a long carrier radiative lifetime. The latest progress in the understanding of physics of carrier recombination in Si/SiGe nanostructures is reviewed, and a new route toward CMOS compatible light emitters for on-chip optical interconnects is proposed.
Keywords :
CMOS integrated circuits; Ge-Si alloys; carrier lifetime; electroluminescence; epitaxial growth; integrated optoelectronics; light emitting devices; nanophotonics; nanostructured materials; optical interconnections; optical losses; photoluminescence; quenching (thermal); semiconductor quantum dots; semiconductor quantum wells; CMOS compatible light emitter; Si-SiGe; carrier radiative lifetime; carrier recombination; complementary metal-oxide-semiconductor; electroluminescence; epitaxial growth; on-chip optical interconnect; optical waveguide loss; photoluminescence; semiconductor quantum dot; semiconductor quantum well; silicon-germanium nanostructure; temperature 293 K to 298 K; thermal quenching; wavelength 1.3 mum to 1.6 mum; CMOS technology; Germanium silicon alloys; Light emitting diodes; Nanostructures; Optical interconnections; Optical waveguides; Quantum dots; Silicon germanium; Stimulated emission; Temperature; Electroluminescence; germanium; light emission; nanoclusters; nanostructures; photoluminescence; quantum dots; quantum wells; silicon; silicon-germanium;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/JPROC.2009.2020711
Filename :
5075757
Link To Document :
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