DocumentCode :
1076707
Title :
Some device aspects of the epitaxial collector IIL/MTL technology
Author :
Tjia, Vincent H H ; Koopmans, Jan M. ; Vrijmoed, Hans ; Poorter, Teunis
Author_Institution :
Delft University of Technology, Delft, The Netherlands
Volume :
28
Issue :
12
fYear :
1981
fDate :
12/1/1981 12:00:00 AM
Firstpage :
1474
Lastpage :
1479
Abstract :
Device aspects of the epitaxial collector IIL/MTL configuration incorporating Schottky-barrier junctions (SBJ´s) as output contacts (Schottky coupled IIL or Schottky coupled transistor logic) and V-grooves as lateral isolation is discussed. Typical figures for single output gates are a power-delay product of 0.10-0.18 pJ and a minimum propagation delay of 3.5-5 ns with 5- 7.5-µm design rules. Using shallow epitaxy and a reduced effective temperature of the high temperature processing steps, a 1-ns speed operation is predicted with a 4-µm feature size, thus approaching other advanced bipolar logic performances, while maintaining IIL power economy, gate density, and layouting flexibility.
Keywords :
Boron; Epitaxial growth; Epitaxial layers; Etching; Isolation technology; Large scale integration; Logic devices; Propagation delay; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1981.20633
Filename :
1481785
Link To Document :
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