DocumentCode :
1076935
Title :
Tunneling Field-Effect Transistors (TFETs) With Subthreshold Swing (SS) Less Than 60 mV/dec
Author :
Choi, Woo Young ; Park, Byung-Gook ; Lee, Jong Duk ; Liu, Tsu-Jae King
Author_Institution :
California Univ., Berkeley
Volume :
28
Issue :
8
fYear :
2007
Firstpage :
743
Lastpage :
745
Abstract :
We have demonstrated a 70-nm n-channel tunneling field-effect transistor (TFET) which has a subthreshold swing (SS) of 52.8 mV/dec at room temperature. It is the first experimental result that shows a sub-60-mV/dec SS in the silicon-based TFETs. Based on simulation results, the gate oxide and silicon-on-insulator layer thicknesses were scaled down to 2 and 70 nm, respectively. However, the ON/ OFF current ratio of the TFET was still lower than that of the MOSFET. In order to increase the on current further, the following approaches can be considered: reduction of effective gate oxide thickness, increase in the steepness of the gradient of the source to channel doping profile, and utilization of a lower bandgap channel material
Keywords :
field effect transistors; tunnel transistors; TFET; channel doping profile; gate oxide; silicon-on-insulator layer thicknesses; size 70 nm; subthreshold swing; tunneling field-effect transistor; Doping profiles; FETs; MOSFET circuits; Photonic band gap; Power MOSFET; Power supplies; Silicon on insulator technology; Temperature; Threshold voltage; Tunneling; Subthreshold swing (SS); tunneling field-effect transistor (TFET);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2007.901273
Filename :
4278352
Link To Document :
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