• DocumentCode
    1077065
  • Title

    35-nm Zigzag T-Gate \\hbox {In}_{0.52}\\hbox {Al}_{0.48} \\hbox {As/In}_{0.53}\\hbox {Ga}_{0.47}\\hbox {As} Metamorphic GaAs HEMTs W

  • Author

    Lee, Kang-Sung ; Kim, Young-Su ; Hong, Yun-Ki ; Jeong, Yoon-Ha

  • Author_Institution
    Pohang Univ. Sci. of & Technol., Pohang
  • Volume
    28
  • Issue
    8
  • fYear
    2007
  • Firstpage
    672
  • Lastpage
    675
  • Abstract
    Metamorphic GaAs high electron mobility transistors (mHEMTs) with the highest-f max reported to date are presented here. The 35-nm zigzag T-gate In0.52Al0.48As/In0.53Ga0.47As metamorphic GaAs HEMTs show f maxof 520 GHz, f T of 440 GHz, and maximum transconductance (g m) of 1100 mS/mm at a drain current of 333 mA/mm. The combinations of f max and f T are the highest data yet reported for mHEMTs. These devices are promising candidates for aggressively scaled sub-35-nm T-gate mHEMTs.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; submillimetre wave transistors; In0.52Al0.48As-In0.53Ga0.47As; frequency 440 GHz; frequency 520 GHz; maximum transconductance; metamorphic HEMT; metamorphic high electron mobility transistor; size 35 nm; zigzag T-gate; Cutoff frequency; Dielectric materials; Foot; Gallium arsenide; HEMTs; MODFETs; Resists; Transistors; Wet etching; mHEMTs; High-electron mobility transistor (HEMT); metamorphic; metamorphic high electron mobility transistor (mHEMT); nanometer scale T-gate; zigzag T-gate;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2007.901579
  • Filename
    4278365