DocumentCode
1077146
Title
Inversion-mode insulated gate Ga0.47 In0.53 As field-effect transistors
Author
Wieder, H.H. ; Clawson, A.R. ; Elder, D.I. ; Collins, D.A.
Author_Institution
Naval Ocean Systems Center, San Diego, California
Volume
2
Issue
3
fYear
1981
fDate
3/1/1981 12:00:00 AM
Firstpage
73
Lastpage
74
Abstract
It is demonstrated that inversion-mode n-channel insulated gate field-effect transistors can be made of p-type heteroepitaxially-grown Ga0.47 In0.53 As layers on semi-insulating InP.
Keywords
Dielectrics; Epitaxial layers; FETs; Indium phosphide; Insulation; Ocean temperature; Plasma temperature; Silicon alloys; Substrates; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1981.25345
Filename
1481829
Link To Document