DocumentCode
1077288
Title
How does the potential get from A to B in a plasma?
Author
Hershkowitz, Noah
Author_Institution
Dept. of Nucl. Eng. & Eng. Phys., Wisconsin Univ., Madison, WI, USA
Volume
22
Issue
1
fYear
1994
fDate
2/1/1994 12:00:00 AM
Firstpage
11
Lastpage
21
Abstract
Solutions to the question of how the plasma potential varies from point A to point B, at which the values are specified, are discussed. Each answer depends on plasma and boundary conditions. Plasma potential structures measured by emissive probes are considered. Examples include potentials associated with sheaths and presheaths in collisionless and collisional systems, unmagnetized and magnetized double layers with single and multiple step transitions, semiconductor etching and rf self bias, tandem mirror plasma confinement and tokamak antenna impurity production. DC structures, time average structures associated with capacitive and inductive rf and the role of potential well pumping are considered
Keywords
magnetic mirrors; plasma collision processes; plasma density; plasma diagnostics; plasma impurities; plasma sheaths; sputter etching; DC structures; RF self bias; collisional systems; collisionless systems; emissive probes; magnetized double layers; plasma potential structures; potential well pumping; presheaths; semiconductor etching; sheaths; step transitions; tandem mirror plasma confinement; time average structures; tokamak antenna impurity production; unmagnetized double layers; Antenna measurements; Boundary conditions; Etching; Magnetic confinement; Magnetic semiconductors; Plasma applications; Plasma confinement; Plasma measurements; Plasma sheaths; Probes;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.281545
Filename
281545
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