DocumentCode :
1077623
Title :
Effect of lifetime on SOS capacitance measurements
Author :
Hamner, S. ; Farrington, D. ; Levis, M.
Author_Institution :
Hewlett-Packard, Cupertino Integrated Circuits Operation, Cupertino, CA
Volume :
2
Issue :
7
fYear :
1981
fDate :
7/1/1981 12:00:00 AM
Firstpage :
187
Lastpage :
189
Abstract :
For SOS devices, the capacitance-voltage curves at various frequencies differ dramatically between MOS capacitors with and without a sidewall. This is explained in terms of the increase in minority carrier generation rate as the silicon-sapphire interface is approached. In some cases, this property facilitates the determination of the threshold voltage of the parasitic sidewall capacitor.
Keywords :
Capacitance measurement; Capacitance-voltage characteristics; Frequency measurement; Helium; Integrated circuit measurements; MOS capacitors; MOSFET circuits; Silicon; Steady-state; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1981.25393
Filename :
1481877
Link To Document :
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