DocumentCode
1077799
Title
Plasma formation of buffer layers for multilayer resist structures
Author
Dobkin, D.M. ; Cantos, B.D.
Author_Institution
Watkins-Johnson Company, Palo Alto, CA
Volume
2
Issue
9
fYear
1981
fDate
9/1/1981 12:00:00 AM
Firstpage
222
Lastpage
224
Abstract
Recently, Li and Richards described a plasma treatment which may be used to prevent intermixing of successive layers of positive resists. We have studied the characteristics of the fluorinated polymer layers produced by this process, and have used a modification of the process to perform multilayer lithography for device fabrication.
Keywords
Buffer layers; Etching; Fabrication; Nonhomogeneous media; Plasma applications; Plasma displays; Plasma measurements; Plasma properties; Resists; Surface treatment;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1981.25411
Filename
1481895
Link To Document