DocumentCode
1077980
Title
Cr-MIS solar cells using thin epitaxial silicon grown on poly-silicon substrates
Author
Anderson, W.A. ; Rajeswaran, G. ; Rao, V.J. ; Thayer, M.
Author_Institution
State University of New York at Buffalo, Amherst, NY
Volume
2
Issue
10
fYear
1981
fDate
10/1/1981 12:00:00 AM
Firstpage
271
Lastpage
274
Abstract
Cr-MIS solar cells were fabricated on 18-30 µm epitaxial-Si layers grown on poly-Si substrates. Solar conversion efficiency values ranged from an average of 8.8% to 4.0% depending on choice of substrate. Nonuniformity of certain substrates led to low efficiency values. Interface state density > 5 × 1012/cm2-eV contributed to low Voc and high n-factor. Low minority carrier diffusion length caused Jsc to drop to 60% of the optimum value. Substrates with imperfections caused an increase in dark current density by three orders of magnitude, which served to decrease photovoltaic response. The procedures given herein could lead to a low-cost solar cell for terrestrial applications.
Keywords
Crystallization; Epitaxial growth; Etching; Inductors; Interface states; Photovoltaic cells; Photovoltaic systems; Silicon; Solar power generation; Substrates;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1981.25429
Filename
1481913
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