• DocumentCode
    1077980
  • Title

    Cr-MIS solar cells using thin epitaxial silicon grown on poly-silicon substrates

  • Author

    Anderson, W.A. ; Rajeswaran, G. ; Rao, V.J. ; Thayer, M.

  • Author_Institution
    State University of New York at Buffalo, Amherst, NY
  • Volume
    2
  • Issue
    10
  • fYear
    1981
  • fDate
    10/1/1981 12:00:00 AM
  • Firstpage
    271
  • Lastpage
    274
  • Abstract
    Cr-MIS solar cells were fabricated on 18-30 µm epitaxial-Si layers grown on poly-Si substrates. Solar conversion efficiency values ranged from an average of 8.8% to 4.0% depending on choice of substrate. Nonuniformity of certain substrates led to low efficiency values. Interface state density > 5 × 1012/cm2-eV contributed to low Vocand high n-factor. Low minority carrier diffusion length caused Jscto drop to 60% of the optimum value. Substrates with imperfections caused an increase in dark current density by three orders of magnitude, which served to decrease photovoltaic response. The procedures given herein could lead to a low-cost solar cell for terrestrial applications.
  • Keywords
    Crystallization; Epitaxial growth; Etching; Inductors; Interface states; Photovoltaic cells; Photovoltaic systems; Silicon; Solar power generation; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1981.25429
  • Filename
    1481913