• DocumentCode
    107799
  • Title

    High Optical Power Density Forward-Biased Silicon LEDs in Standard CMOS Process

  • Author

    Rong Xie ; Luhong Mao ; Weilian Guo ; Sheng Xie ; Shilin Zhang ; Lei Han ; Fan Zhao

  • Author_Institution
    Dept. of Electron. & Inf. Eng., Tianjin Univ., Tianjin, China
  • Volume
    27
  • Issue
    2
  • fYear
    2015
  • fDate
    Jan.15, 15 2015
  • Firstpage
    121
  • Lastpage
    124
  • Abstract
    This letter presents three low-operating-voltage silicon-based light-emitting devices (Si-LEDs) designed and made in a commercial standard 0.18-μm CMOS process without any modification. The Si-LEDs with a new threeterminal and wedge-shaped forward-biased carrier-injection-type p+-n junction structure, have high optical powers. The output power increases by two orders of magnitude up to 1.78 μW without saturation when the forward current is increased from 20 mA to 200 mA. The light-emitting area is the n-type drift region between the n+ region and p+ region. When the forward current increases to 200 mA, the optical power density exceeds 30 nW · μm-2 the power conversion efficiency and external quantum efficiency are ~2 × 10-6 and 8.3 × 10-6, respectively, higher than all other forward-biased Si-LEDs previously reported to have used CMOS processes without any modification.
  • Keywords
    light emitting diodes; low-power electronics; optical materials; p-n junctions; silicon; Si; commercial standard CMOS process; current 20 mA to 200 mA; external quantum efficiency; forward current; forward-biased Si-LED; high optical power density forward-biased silicon LED; light-emitting area; low-operating-voltage silicon-based light-emitting devices; n-type drift region; n+ region; output power; p+ region; power 1.78 muW; power conversion efficiency; terminal; wedge-shaped forward-biased carrier-injection-type p+-n junction structure; Density measurement; Electric fields; Junctions; Light emitting diodes; Optical saturation; Silicon; Stimulated emission; Complementary metal-oxide-semiconductor (CMOS) process without any modification; forward-biased carrier-injection-type; optical power density; p+-n junction; silicon-based light-emitting devices (Si-LEDs);
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2014.2362983
  • Filename
    6923455