DocumentCode
1078031
Title
Low dark-current, high-efficiency planar In0.53 Ga0.47 As/InP P-I-N photodiodes
Author
Forrest, S.R. ; Camlibel, I. ; Kim, O.K. ; Stocker, H.J. ; Zuber, J.R.
Author_Institution
Bell Laboratories, Murray Hill, NJ
Volume
2
Issue
11
fYear
1981
fDate
11/1/1981 12:00:00 AM
Firstpage
283
Lastpage
285
Abstract
We have fabricated high quantum efficiency, high speed, low dark-current In0.53 Ga0.47 As/InP p-i-n planar photodiodes Which meet the performance requirements of long-wavelength optical communications systems. The diodes employ plasma deposited SiNx as a mask to Zn diffusion. The dark-current density at 10 V is J = 5 × 10-5A/cm2with a corresponding capacitance of C = 5 × 10-9F/cm2.
Keywords
Capacitance; Dark current; Indium phosphide; Inorganic materials; P-i-n diodes; PIN photodiodes; Photodetectors; Silicon compounds; Voltage; Zinc;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1981.25434
Filename
1481918
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