• DocumentCode
    1078130
  • Title

    Breakdown characteristics of gallium arsenide

  • Author

    Baliga, B.J. ; Ehle, R. ; Shealy, J.R. ; Garwacki, W. ; Garwacki, W.

  • Author_Institution
    General Electric Company, Schenectady, NY
  • Volume
    2
  • Issue
    11
  • fYear
    1981
  • fDate
    11/1/1981 12:00:00 AM
  • Firstpage
    302
  • Lastpage
    304
  • Abstract
    This paper presents a comparison of the experimentally measured breakdown characteristics of high-purity gallium arsenide epitaxial layers with the theoretical calculations reported in the literature. The experimental data has been obtained by forming gold Schottky barrier diodes on material grown by using two different liquid phase epitaxial growth techniques. Good agreement is observed between the measured data and the breakdown voltages calculated by Lee and Sze[4] for
  • Keywords
    Avalanche breakdown; Breakdown voltage; Doping; Electric breakdown; Epitaxial growth; Epitaxial layers; Gallium arsenide; Gold; Schottky diodes; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1981.25442
  • Filename
    1481926