DocumentCode :
1078266
Title :
Electroabsorption properties of InGaAs/InAlAs multiple quantum well structures at 1.5 μm
Author :
Chin, M.K. ; Chang, W.S.C.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., San Diego, La Jolla, CA, USA
Volume :
6
Issue :
4
fYear :
1994
fDate :
4/1/1994 12:00:00 AM
Firstpage :
502
Lastpage :
504
Abstract :
The electroabsorption properties of InGaAs/InAlAs MQW structures are characterised in terms of /spl Delta//spl alpha/, /spl Delta//spl alpha//F and /spl Delta//spl alpha///spl alpha/0, where /spl Delta//spl alpha/ is the electroabsorption, /spl alpha/0 is the residual absorption coefficient under zero bias, and F is the applied electric field. The limitations of these structures for 1.5 μm modulators are primarily due to the relatively small /spl Delta//spl alpha//F values as a result of the small well width. The results are compared with the literature.
Keywords :
III-V semiconductors; aluminium compounds; electro-optical devices; electroabsorption; gallium arsenide; indium compounds; integrated optics; optical modulation; semiconductor quantum wells; 1.5 /spl mu/m modulators; 1.5 mum; InGaAs-InAlAs; InGaAs/InAlAs; MQW; applied electric field; electroabsorption properties; multiple quantum well structures; residual absorption coefficient; small well width; zero bias; Absorption; Composite materials; Indium compounds; Indium gallium arsenide; Indium phosphide; Material properties; Optical modulation; PIN photodiodes; Propagation losses; Quantum well devices;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.281809
Filename :
281809
Link To Document :
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