Title :
Characteristics of high-power and high-breakdown-voltage static induction transistor with the high maximum frequency of oscillation
Author :
Kotani, Michio ; Higaki, Yukio ; Kato, Mari ; Yukimoto, Yoshinori
Author_Institution :
Mitsubishi Electric Corporation, Itami, Hyogo, Japan
fDate :
2/1/1982 12:00:00 AM
Abstract :
The design and fabrication of high-power and high-breakdown-voltage static induction transistor (SIT) with a high maximum frequency of oscillation are described and then the experimental characteristics are presented. A field plate is used to make the breakdown voltage high, and a fine stripe structure is adopted to make the maximum frequency of oscillation high. As a result, the gate-drain breakdown voltage of 300 V, the gate-source breakdown voltage of 70 V, and the maximum frequency of oscillation of 700 MHz are obtained. The maximum output power of 216 W with 7.5-dB gain and 55- percent drain efficiency is obtained at 100 MHz without a thermal runaway from an amplifying SIT with four pellets mounted in a single package.
Keywords :
Doping; Epitaxial layers; Fabrication; Hafnium; Heating; Large scale integration; Power generation; Radio frequency; Semiconductor device packaging; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1982.20683