DocumentCode :
1078612
Title :
RECIPE—A two-dimensional VLSI process modeling program
Author :
Smith, George E., III ; Steckl, Andrew J.
Author_Institution :
International Business Machines Corp., Fishkill, NY
Volume :
29
Issue :
2
fYear :
1982
fDate :
2/1/1982 12:00:00 AM
Firstpage :
216
Lastpage :
221
Abstract :
REnsselaer Computer integrated Circuits Process Engineering (RECIPE) is a two-dimensional (2-D) integrated circuit process modeling program developed for use in VLSI applications. The program incorporates a 2-D diffusion model which includes the concentration dependence of the diffusion coefficients. An incremental solution method is used to compute the appropriate diffusion coefficients as a function of impurity concentration throughout space. RECIPE also incorporates a 2-D ion-implantation model. While intended as a general-purpose modeling program, RECIPE has been used to study channel-length decrease of short-channel MOSFET´s during high-temperature processing. A typical phosphorus-implanted (150 keV, 1016/cm2) 1-µm gate transistor had no channel after processing for 60 min at 1000°C, while an arsenic-implanted device had an effective channel length of ∼ 0.1 µm after similar processing.
Keywords :
Application software; Application specific integrated circuits; Circuit simulation; Etching; Impurities; Integrated circuit modeling; Ion implantation; Space technology; Two dimensional displays; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20687
Filename :
1482184
Link To Document :
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