DocumentCode :
1078825
Title :
Low-threshold 833-nm GaAsP-AlGaAs tensile-strained quantum-well laser diodes
Author :
Sun, D. ; Treat, D.W.
Author_Institution :
Xerox Palo Alto Res. Center, CA, USA
Volume :
8
Issue :
1
fYear :
1996
Firstpage :
13
Lastpage :
15
Abstract :
We report the demonstration of TM polarized laser emission at 833 nm from GaAsP-AlGaAs quantum well laser structures grown on GaAs substrates by low-pressure organometallic vapor phase epitaxy for the first time. This is the longest wavelength near infrared TM polarized laser ever reported. Broad area laser diodes containing single GaAs/sub 0.95/P/sub 0.05/ quantum well lased at a low threshold current density of 280 A/cm2 for a cavity length of 1 mm and with a high differential quantum efficiency of 32%/facet for cavity length less than 500 μm.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; quantum well lasers; vapour phase epitaxial growth; 833 nm; GaAsP-AlGaAs; broad area laser diodes; differential quantum efficiency; low-pressure organometallic vapor phase epitaxy; near infrared TM polarized emission; tensile-strained quantum-well lasers; threshold current density; Diode lasers; Epitaxial growth; Gallium arsenide; Laser modes; Laser transitions; Optical polarization; Quantum well lasers; Substrates; Tellurium; Threshold current;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.475762
Filename :
475762
Link To Document :
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