DocumentCode
1078837
Title
Demonstration of an ion-implanted, wavelength-shifted quantum-well laser
Author
Poole, P.J. ; Charbonneau, S. ; Dion, M. ; Aers, G.C. ; Buchanan, M. ; Goldberg, R.D. ; Mitchell, I.V.
Author_Institution
Inst. for Microstructural Sci., Nat. Res. Council of Canada, Ottawa, Ont., Canada
Volume
8
Issue
1
fYear
1996
Firstpage
16
Lastpage
18
Abstract
A technique for fabricating many different wavelength lasers on the same wafer has been developed. High energy ion implantation was used to selectively blue shift the emission wavelength of an InP-based quantum well laser structure. This structure was then processed into fully functional broad-area lasers whose current threshold was unaffected by the implantation process, indicating extremely high material quality after bandgap-shifting. This process has the potential for the integration of not only different wavelength lasers, but also other devices, such as waveguides, detectors, modulators, etc., on a single wafer.
Keywords
III-V semiconductors; indium compounds; ion implantation; optical fabrication; quantum well lasers; spectral line shift; InP; bandgap shifting; blue shift; broad-area laser; fabrication; ion implantation; quantum-well laser; threshold current; wafer integration; wavelength shifting; Atomic beams; Etching; Impurities; Indium gallium arsenide; Indium phosphide; Optical materials; Photonic band gap; Quantum well lasers; Rapid thermal annealing; Waveguide lasers;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.475763
Filename
475763
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