Quadruply self-aligned stacked high-capacitance RAM using Ta2O5high-density VLSI dynamic memory

A new one-transistor, one-capacitor RAM cell structure called a Quadruply Self-Aligned Stacked High Capacitance (QSA SHC) RAM is proposed as a basic cell for a future one-million-bit VLSI memory. This cell consists of a QSA MOSFET and a Ta2O5capacitor stacked on it. By this cell, the ultimate cell area can be realized with sufficient operating margin. Here, is the minimum feature size. The basic cell was fabricated and its operation was experimentally verified. The leakage current of Ta2O5film was small enough for the storage capacitor dielectric. Using a cell and a pitch sense amplifier, a one-million-bit memory was designed with a 2-µm rule. A cell size of 6.5 × 8 µm², and a chip size of 9.2 × 9.5 mm²were obtained. The access time, neglecting the RC time constant of the word line, was estimated to be about 170 ns. Based on this design, it is argued that a future one-million-bit memory can be realized by QSA SHC technology with a 2-1-µm process. The mask set of the 1-Mbit RAM was actually fabricated by an electron-beam mask maker. A photomicrograph of the 1-Mbit RAM chip patterned by the mask set is shown. This chip was patterned not to get an operating sample but to show an actual chip image of the future 1- Mbit RAM. The area of each circuit block including storage array can be seen in this chip image.