DocumentCode :
1078900
Title :
SOS MOSFET two-dimensional analysis
Author :
Fukuma, Masao ; Ohno, Yasuo ; Okuto, Yuji
Author_Institution :
Nippon Electric Co., Ltd., Kawasaki, Japan
Volume :
29
Issue :
3
fYear :
1982
fDate :
3/1/1982 12:00:00 AM
Firstpage :
410
Lastpage :
413
Abstract :
Two-dimensional analysis of short-channel SOS MOSFET´s is presented, The analysis is based on the circular-field-line approximation to determine the boundary conditions in the sapphire substrate. Si-sapphire interface-state effects are taken into account. Using this analysis method, short-channel SOS MOSFET characteristics were investigated. The electric-field lines, originating from the drain, are terminated not only in the Si substrate charge but also in the interface states. The interface states can suppress the short-channel effects in either n- or p-channel SOS MOSFET´s. Predicted characteristics agree with the experimental results.
Keywords :
Boundary conditions; Dielectric substrates; Gallium arsenide; Insulation; Interface states; Leakage current; MOSFET circuits; Numerical analysis; Poisson equations; Shape;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20716
Filename :
1482213
Link To Document :
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