• DocumentCode
    107902
  • Title

    Sub-kT/q Switching in Strong Inversion in PbZr0.52Ti0.48O3 Gated Negative Capacitance FETs

  • Author

    Dasgupta, S. ; Rajashekhar, A. ; Majumdar, K. ; Agrawal, N. ; Razavieh, A. ; Trolier-Mckinstry, S. ; Datta, S.

  • Author_Institution
    Department of Electrical Engineering, Pennsylvania State University, University Park, PA, USA
  • Volume
    1
  • fYear
    2015
  • fDate
    Dec. 2015
  • Firstpage
    43
  • Lastpage
    48
  • Abstract
    Hysteretic switching with a sub-kT/q steep slope (13 mV/decade at room temperature) is experimentally demonstrated in MOSFETs with PbZr0.52 Ti0.48O3 as a ferroelectric (FE) gate insulator, integrated on a silicon channel with a nonperovskite high-k dielectric (HfO2) as a buffer interlayer. The steep switching is independent of drain bias. For the first time, sub-kT/q switching due to FE negative capacitance is observed not at low currents, but in strong inversion ( {I}_{d}\\sim 100 \\mu text{A}/\\mu text{m} ). Steep switching in strong inversion provides an important point of consistency with the predictions of the Landau–Devonshire theory and the Landau–Khalatnikov equation.
  • Keywords
    Capacitance; Field effect transistors; Hafnium compounds; Iron; Lead; Logic gates; Silicon; Ferroelectric (FE) field-effect transistor (FET); Ferroelectric FET; Lead Zirconate Titanate; Negative Capacitance; Sub-kT/q Switching; lead zirconate titanate; negative capacitance (NC); sub-kT/q switching;
  • fLanguage
    English
  • Journal_Title
    Exploratory Solid-State Computational Devices and Circuits, IEEE Journal on
  • Publisher
    ieee
  • ISSN
    2329-9231
  • Type

    jour

  • DOI
    10.1109/JXCDC.2015.2448414
  • Filename
    7130555