• DocumentCode
    1079267
  • Title

    Design and Properties of Phototransistor Photodetector in Standard 0.35- \\mu m SiGe BiCMOS Technology

  • Author

    Lai, Kuang-Sheng ; Huang, Ji-Chen ; Hsu, Klaus Y -J

  • Author_Institution
    Nat. Tsing Hua Univ., Hsinchu
  • Volume
    55
  • Issue
    3
  • fYear
    2008
  • fDate
    3/1/2008 12:00:00 AM
  • Firstpage
    774
  • Lastpage
    781
  • Abstract
    In this paper, without altering any step of the commercial 0.35-mum SiGe BiCMOS process, a novel photodetector named phototransistor photodetector (PTPD) has been realized and demonstrated. The PTPD shows high photoresponsivity and its structure relaxes the tradeoff between sensitivity and speed. Responsivities of 9.5 A/W for 670 nm light and of 5.2 A/W for 850 nm light were achieved. The operation details of the PTPD are introduced in this paper. The device can be readily integrated with other on-chip circuits to form a high-performance optoelectronic IC. The low cost, the high performance, and the flexibility in optical-electrical design allow the SiGe PTPD to be used in many demanding applications.
  • Keywords
    BiCMOS integrated circuits; Ge-Si alloys; integrated circuit design; integrated optoelectronics; photodetectors; phototransistors; sensitivity; SiGe; optoelectronic IC design; photoresponsivity; phototransistor photodetector; sensitivity; size 0.35 mum; standard BiCMOS technology; wavelength 670 nm; wavelength 850 nm; Application specific integrated circuits; BiCMOS integrated circuits; Costs; Flexible printed circuits; Germanium silicon alloys; Integrated optics; Photodetectors; Photonic integrated circuits; Phototransistors; Silicon germanium; Photodetector; SiGe; phototransistor; responsivity;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.915385
  • Filename
    4455784