DocumentCode :
1079343
Title :
Application and Evaluation of the RF Charge-Pumping Technique
Author :
Sasse, Guido T. ; Schmitz, Jurriaan
Author_Institution :
Univ. of Twente, Enschede
Volume :
55
Issue :
3
fYear :
2008
fDate :
3/1/2008 12:00:00 AM
Firstpage :
881
Lastpage :
889
Abstract :
In this paper, we will discuss the extendibility of the charge-pumping (CP) technique toward frequencies up to 4 GHz. Such high frequencies are attractive when a significant gate leakage current flows, obscuring the CP current at lower pumping frequencies. It is shown that using RF gate excitation, accurate CP curves can be obtained on MOS devices with a leakage current density exceeding 1 Aldrcm-2. A theoretical analysis of the trap response to RF gate voltage signals is presented, giving a clear insight on the benefits and limitations of the technique.
Keywords :
MIS devices; leakage currents; microwave devices; MOS device; RF charge-pumping technique; RF gate excitation; RF gate voltage signal; gate leakage current; trap response; CMOS technology; Charge pumps; Current measurement; Gate leakage; Interface states; Leakage current; MOS devices; Radio frequency; Signal analysis; Voltage; CMOS; Characterization; RF; charge pumping (CP); dielectrics; trap response; tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.915088
Filename :
4455791
Link To Document :
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