DocumentCode
1079343
Title
Application and Evaluation of the RF Charge-Pumping Technique
Author
Sasse, Guido T. ; Schmitz, Jurriaan
Author_Institution
Univ. of Twente, Enschede
Volume
55
Issue
3
fYear
2008
fDate
3/1/2008 12:00:00 AM
Firstpage
881
Lastpage
889
Abstract
In this paper, we will discuss the extendibility of the charge-pumping (CP) technique toward frequencies up to 4 GHz. Such high frequencies are attractive when a significant gate leakage current flows, obscuring the CP current at lower pumping frequencies. It is shown that using RF gate excitation, accurate CP curves can be obtained on MOS devices with a leakage current density exceeding 1 Aldrcm-2. A theoretical analysis of the trap response to RF gate voltage signals is presented, giving a clear insight on the benefits and limitations of the technique.
Keywords
MIS devices; leakage currents; microwave devices; MOS device; RF charge-pumping technique; RF gate excitation; RF gate voltage signal; gate leakage current; trap response; CMOS technology; Charge pumps; Current measurement; Gate leakage; Interface states; Leakage current; MOS devices; Radio frequency; Signal analysis; Voltage; CMOS; Characterization; RF; charge pumping (CP); dielectrics; trap response; tunneling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2007.915088
Filename
4455791
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