• DocumentCode
    1079343
  • Title

    Application and Evaluation of the RF Charge-Pumping Technique

  • Author

    Sasse, Guido T. ; Schmitz, Jurriaan

  • Author_Institution
    Univ. of Twente, Enschede
  • Volume
    55
  • Issue
    3
  • fYear
    2008
  • fDate
    3/1/2008 12:00:00 AM
  • Firstpage
    881
  • Lastpage
    889
  • Abstract
    In this paper, we will discuss the extendibility of the charge-pumping (CP) technique toward frequencies up to 4 GHz. Such high frequencies are attractive when a significant gate leakage current flows, obscuring the CP current at lower pumping frequencies. It is shown that using RF gate excitation, accurate CP curves can be obtained on MOS devices with a leakage current density exceeding 1 Aldrcm-2. A theoretical analysis of the trap response to RF gate voltage signals is presented, giving a clear insight on the benefits and limitations of the technique.
  • Keywords
    MIS devices; leakage currents; microwave devices; MOS device; RF charge-pumping technique; RF gate excitation; RF gate voltage signal; gate leakage current; trap response; CMOS technology; Charge pumps; Current measurement; Gate leakage; Interface states; Leakage current; MOS devices; Radio frequency; Signal analysis; Voltage; CMOS; Characterization; RF; charge pumping (CP); dielectrics; trap response; tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.915088
  • Filename
    4455791