DocumentCode :
1079378
Title :
Scaling limitations of monolithic polycrystalline-Silicon resistors in VLSI static RAM´s and logic
Author :
Lu, Nicky Chau-chun ; Gerzberg, Levy ; Meindl, James D.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume :
29
Issue :
4
fYear :
1982
fDate :
4/1/1982 12:00:00 AM
Firstpage :
682
Lastpage :
690
Abstract :
Quantitative design criteria for monolithic polycrystalline-silicon resistors are established from physical models to develop an optimal device design. Based on the results, the parameters that limit the scaling of polysilicon resistors are identified, and a first-order estimation of minimum device dimensions is projected. The impact of this scaling on the performance of VLSI static RAM´s and logic is analyzed in terms of chip area, power, sensitivity to radiation, rise time, voltage swing, and noise margin. Based on constant-power scaling rules, resistor scaling is limited by the permissible nonlinearity dictated primarily by maximum rise time and sensitivity to radiation. After constant-field scaling, the speed-power product is improved; however, the circuits have less noise margin and voltage swing and become more sensitive to radiation.
Keywords :
Conductivity; Crystallization; Grain boundaries; Logic circuits; Logic devices; Resistors; Silicon; Thermionic emission; Very large scale integration; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20762
Filename :
1482259
Link To Document :
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