DocumentCode
1079442
Title
Programming mechanism of polysilicon resistor fuses
Author
Greve, David W.
Author_Institution
Signetics Corporation, Sunnyvale, CA
Volume
29
Issue
4
fYear
1982
fDate
4/1/1982 12:00:00 AM
Firstpage
719
Lastpage
724
Abstract
The programming characteristics of polysilicon resistor fuses were investigated. It was found that an open circuit occurs only after the fuse makes a transition to a second-breakdown state in which the current flow is mainly through a molten filament. Filamentary current flow is stable since the resistivity of silicon decreases abruptly upon melting. A simple model was developed which explains the observed
characteristics. Fuse opening occurs when the current in second breakdown exceeds a critical current Imin which depends strongly on the fuse thickness and the presence or absence of a passivation layer over the fuse. The gap forms at the positive end, suggesting that the silicon ions move by drift in the applied electric field.
characteristics. Fuse opening occurs when the current in second breakdown exceeds a critical current IKeywords
Circuits; Contact resistance; Electric breakdown; Fuses; Power dissipation; Resistors; Silicon; Temperature; Thermal conductivity; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20768
Filename
1482265
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