Title :
Laser annealing of ion implantation damage in semiconductors with KrF excimer laser radiation
Author_Institution :
Hughes Research Labs., Malibu, CA, USA
fDate :
9/1/1979 12:00:00 AM
Keywords :
Laser applications, materials processing; Annealing; Backscatter; Chemical lasers; Crystalline materials; Crystallization; Gallium arsenide; Ion implantation; Optical materials; Semiconductor lasers; Silicon;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1979.1070302
